Crystalline tungsten oxide film can be prepared on FTO transparent conducting glass. According to reports, some experts have used pulsed DC reactive magnetron sputtering coating method to prepare crystalline tungsten oxide thin films with different thicknesses on FTO conductive glass. Experts said that as a cathode electrochromic layer that has the greatest influence on the optical modulation amplitude and coloring efficiency of the entire device in the electrochromic device, a tungsten oxide film with suitable thickness should be selected.
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In addition, the experts also said that the prepared film has a monoclinic structure. As the thickness increases, the degree of crystallization gradually increases, and the surface roughness gradually decreases. After the film is colored, the monoclinic system WO2.92 is transformed into the cubic system WO3, and the lattice strain is generated. The thickness of the film increases, the lattice strain first decreases and then increases. When the film thickness is 250nm, the lattice strain is the smallest. When the film thickness is increased to 300nm, the film coloration produces a significant increase in strain. The surface roughness changes before and after coloring of different thickness films are consistent with the lattice strain. The roughness first decreases and then increases. The surface roughness of the film before and after coloring at 250nm is the smallest.
