Tungsten oxide film can be produced on FTO transparent conducting glass. According to experts, the transparent tungsten oxide electrochromic film is a dingal film that may be applied to architectural glass to obtain smart glass with thermal insulating properties. In order to study the effect of different substrate temperature on the structure and properties of tungsten oxide film, metal tungsten (purity 99.9%) was used as the target, and WO3 film was deposited by sputtering on FTO conductive glass substrate with pulsed DC power supply. The specific preparation conditions are as follows:
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Before sputtering, the coating chamber is vacuumed to less than 4.5×10-4Pa, high purity argon (99.9% Ar) is used as working gas, high purity oxygen (99.9% O2) is used as reaction gas, and the working pressure is fixed at 1.7Pa. The flow rate of Ar is 15sccm and the flow rate of O2 is 13sccm. The tungsten oxide film with different substrate temperatures is deposited by changing the substrate temperature to room temperature, 200°C, 300°C and 350°C, respectively, and the film thickness is controlled at 250±10nm.
